PT  - JOURNAL ARTICLE
AU  - Kejzlar, Pavel
AU  - Bakalova, Totka
AU  - Petkov, Nikolay
AU  - Bahchedzhiev, Hristo
TI  - The Influence of CH4/N2 Gas Ratio on the Structure and Chemical Composition of Cr(C, N) Coatings Deposited by CAD Technology
DP  - 2018 Dec 1
TA  - Manufacturing Technology Journal
PG  - 917--922
VI  - 18
IP  - 6
AID - 10.21062/ujep/201.2018/a/1213-2489/MT/18/6/917
IS  - 12132489
AB  - This article presents the study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and chemical composition of Cr(C,N) coatings. The coatings were deposited by cathodic arc evaporation of pure Cr (99.99 %) cathode under an atmosphere of a mixture of CH4 and N2 gasses at the low deposition temperature of 300 ˚C. The ratio of reactive gasses was changed from 0 to 100 %. Energy-dispersive spectroscopy showed a linear dependence of resulting C/N ratio on the process gas ratio. The roughness of layers prepared from a mixture of process gasses is higher compared to pure gasses.