RT Journal Article
SR Electronic
A1 Kejzlar, Pavel
A1 Bakalova, Totka
A1 Petkov, Nikolay
A1 Bahchedzhiev, Hristo
T1 The Influence of CH4/N2 Gas Ratio on the Structure and Chemical Composition of Cr(C, N) Coatings Deposited by CAD Technology
JF Manufacturing Technology Journal
YR 2018
VO 18
IS 6
SP 917
OP 922
DO 10.21062/ujep/201.2018/a/1213-2489/MT/18/6/917
UL https://journalmt.com/artkey/mft-201806-0008.php
AB This article presents the study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and chemical composition of Cr(C,N) coatings. The coatings were deposited by cathodic arc evaporation of pure Cr (99.99 %) cathode under an atmosphere of a mixture of CH4 and N2 gasses at the low deposition temperature of 300 ˚C. The ratio of reactive gasses was changed from 0 to 100 %. Energy-dispersive spectroscopy showed a linear dependence of resulting C/N ratio on the process gas ratio. The roughness of layers prepared from a mixture of process gasses is higher compared to pure gasses.