Manufacturing Technology 2018, 18(6):917-922 | DOI: 10.21062/ujep/201.2018/a/1213-2489/MT/18/6/917
The Influence of CH4/N2 Gas Ratio on the Structure and Chemical Composition of Cr(C, N) Coatings Deposited by CAD Technology
- 1 Faculty of Mechanical Engineering, Department of Material Science, Technical University of Liberec, Studentska 2, 461 17 Liberec, Czech Republic
- 2 Central Laboratory of Applied Physics, Bulgarian Academy of Sciences, 61, St. Peterburg Blvd. 4000 Plovdiv, Bulgaria
This article presents the study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and chemical composition of Cr(C,N) coatings. The coatings were deposited by cathodic arc evaporation of pure Cr (99.99 %) cathode under an atmosphere of a mixture of CH4 and N2 gasses at the low deposition temperature of 300 ˚C. The ratio of reactive gasses was changed from 0 to 100 %. Energy-dispersive spectroscopy showed a linear dependence of resulting C/N ratio on the process gas ratio. The roughness of layers prepared from a mixture of process gasses is higher compared to pure gasses.
Keywords: CAD technology, Cr(C,N) coatings, Surface morphology, Roughness
Published: December 1, 2018 Show citation
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